ULVAC developed the technique for growing carbon nanotube vertically and selectively on a substrate for the first time in the world. By using the microwave plasma CVD technique, ULVAC has succeeded in mass production of nanotubes with high purity. Drastic improvement of performance can be expected in many fields, including cells and storage of hydrogen.
| CN-CVD-400 | |
| Maximum substrate size | 4 inches in diameter |
| Footprint | 3.5m × 1.7m × 2.1m (not including maintenance space) |
| AC power supply | 200V ±10% |
| Duct tie-in | NW25KF |
| Attenuating gas | Nitrogen >10 SLM |
| Process gas tie-in | VCR 6.35mm |